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Metal-insulator transition and superconductivity in boron-doped diamond

  • T. Klein
  • , P. Achatz
  • , J. Kacmarcik
  • , C. Marcenat
  • , F. Gustafsson
  • , J. Marcus
  • , E. Bustarret
  • , J. Pernot
  • , F. Omnes
  • , Bo E. Sernelius
  • , C. Persson
  • , A. Ferreira Da Silva
  • , C. Cytermann

Research output: Contribution to journalArticlepeer-review

Abstract

We report on a detailed analysis of the transport properties and superconducting critical temperatures of boron-doped diamond films grown along the {100} direction. The system presents a metal-insulator transition (MIT) for a boron concentration (nB) on the order of nc ∼4.5× 1020 cm-3, in excellent agreement with numerical calculations. The temperature dependence of the conductivity and Hall effect can be well described by variable range hopping for nB < nc with a characteristic hopping temperature T0 strongly reduced due to the proximity of the MIT. All metallic samples (i.e., for nB > nc) present a superconducting transition at low temperature. The zero-temperature conductivity σ0 deduced from fits to the data above the critical temperature (Tc) using a classical quantum interference formula scales as σ0 (nB nc -1)ν with ν∼1. Large Tc values (≥0.4 K) have been obtained for boron concentration down to nB nc ∼1.1 and Tc surprisingly mimics a (nB nc -1)1 2 law. Those high Tc values can be explained by a slow decrease of the electron-phonon coupling parameter λ and a corresponding drop of the Coulomb pseudopotential μ* as nB → nc.

Original languageEnglish
Article number165313
JournalPhysical Review B - Condensed Matter and Materials Physics
Volume75
Issue number16
DOIs
Publication statusPublished - 17 Apr 2007

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