Skip to main navigation Skip to search Skip to main content

Metallization of warm dense SiO2 studied by xanes spectroscopy

Research output: Contribution to journalArticlepeer-review

Abstract

We investigate the evolution of the electronic structure of fused silica in a dense plasma regime using time-resolved x-ray absorption spectroscopy. We use a nanosecond (ns) laser beam to generate a strong uniform shock wave in the sample and a picosecond (ps) pulse to produce a broadband x-ray source near the Si K edge. By varying the delay between the two laser beams and the intensity of the ns beam, we explore a large thermodynamical domain with densities varying from 1 to 5g/cm3 and temperatures up to 5 eV. In contrast to normal conditions where silica is a well-known insulator with a wide band gap of 8.9 eV, we find that shocked silica exhibits a pseudogap as a semimetal throughout this thermodynamical domain. This is in quantitative agreement with density functional theory predictions performed using the generalized gradient approximation.

Original languageEnglish
Article number116404
JournalPhysical Review Letters
Volume113
Issue number11
DOIs
Publication statusPublished - 12 Sept 2014

Fingerprint

Dive into the research topics of 'Metallization of warm dense SiO2 studied by xanes spectroscopy'. Together they form a unique fingerprint.

Cite this