Micro-nanostructuring by optical-lithography and nitriding of photo-patternable ZrO2 sol-gel to obtain micro-nanostructured ZrN

V. Vallejo-Otero, N. Crespo-Monteiro, A. Valour, C. Donnet, S. Reynaud, N. Ollier, M. F. Blanc Mignon, J. P. Chatelon, Y. Bleu, E. Gamet, Y. Jourlin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Zirconium nitride (ZrN) combines plasmonic properties in the visible and near infrared spectral region with good mechanical properties, high thermal and chemical stability making it a very promising alternative to noble metals for optical applications at high temperature or in extreme environments. The authors present a new process for the elaboration of micro-nanostructured ZrN from a photo-patternable ZrO2 sol-gel and a nitridation process, by rapid thermal annealing. This sol-gel is patternable by optical lithography, it allows to easily and quickly produce patterned ZrN layer.

Original languageEnglish
Title of host publicationAdvances in Optical Thin Films VIII
EditorsMichel Lequime, Detlev Ristau
PublisherSPIE
ISBN (Electronic)9781510673588
DOIs
Publication statusPublished - 1 Jan 2024
Externally publishedYes
EventAdvances in Optical Thin Films VIII 2024 - Strasbourg, France
Duration: 8 Apr 202411 Apr 2024

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13020
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceAdvances in Optical Thin Films VIII 2024
Country/TerritoryFrance
CityStrasbourg
Period8/04/2411/04/24

Keywords

  • Micro-nanostructuring
  • Multiscale structuring
  • Optical properties
  • Rapid thermal nitridation
  • Sol-gel method
  • Zirconium nitride

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