TY - JOUR
T1 - Mobile phone model with metamaterials to reduce the exposure
AU - Pinto, Yenny
AU - Begaud, Xavier
N1 - Publisher Copyright:
© 2016, Springer-Verlag Berlin Heidelberg.
PY - 2016/4/1
Y1 - 2016/4/1
N2 - This work presents a terminal mobile model where an Inverted-F Antenna (IFA) is associated with three different kinds of metamaterials: artificial magnetic conductor (AMC), electromagnetic band gap (EBG) and resistive high-impedance surface (RHIS). The objective was to evaluate whether some metamaterials may be used to reduce exposure while preserving the antenna performances. The exposure has been evaluated using a simplified phantom model. Two configurations, antenna in front of the phantom and antenna hidden by the ground plane, have been evaluated. Results show that using an optimized RHIS, the SAR 10 g is reduced and the antenna performances are preserved. With RHIS solution, the SAR 10 g peak is reduced by 8 % when the antenna is located in front of the phantom and by 6 % when the antenna is hidden by ground plane.
AB - This work presents a terminal mobile model where an Inverted-F Antenna (IFA) is associated with three different kinds of metamaterials: artificial magnetic conductor (AMC), electromagnetic band gap (EBG) and resistive high-impedance surface (RHIS). The objective was to evaluate whether some metamaterials may be used to reduce exposure while preserving the antenna performances. The exposure has been evaluated using a simplified phantom model. Two configurations, antenna in front of the phantom and antenna hidden by the ground plane, have been evaluated. Results show that using an optimized RHIS, the SAR 10 g is reduced and the antenna performances are preserved. With RHIS solution, the SAR 10 g peak is reduced by 8 % when the antenna is located in front of the phantom and by 6 % when the antenna is hidden by ground plane.
U2 - 10.1007/s00339-016-9827-y
DO - 10.1007/s00339-016-9827-y
M3 - Article
AN - SCOPUS:84960420213
SN - 0947-8396
VL - 122
JO - Applied Physics A: Materials Science and Processing
JF - Applied Physics A: Materials Science and Processing
IS - 4
M1 - 336
ER -