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Modification of semiconductor surfaces irradiated by single intense Fs-laser pulses

  • V. V. Temnov
  • , K. Sokolowski-Tinten
  • , N. Stojanovic
  • , S. Kudryashov
  • , D. Von der Linde
  • , B. Kogan
  • , A. Schlarb
  • , B. Weyers
  • , R. Möller
  • University of Duisburg-Essen

Research output: Contribution to conferencePaperpeer-review

Abstract

Ablation morphology produced on GaAs(100) and Si(100) surfaces by single intense fs-laser pulses was investigated using optical interference, differential interference contrast, atomic force and scanning force microscopies. The ablation crater on GaAs manifested itself as a well-defined ring in the optical DIC image. The crated boundary consisted of a rim with a lateral extension of only 50-100 nm and a height of 100-200 nm.

Original languageEnglish
Pages223
Number of pages1
Publication statusPublished - 1 Jan 2002
Externally publishedYes
EventConference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States
Duration: 19 May 200224 May 2002

Conference

ConferenceConference on Lasers and Electro-Optics (CLEO 2002)
Country/TerritoryUnited States
CityLong Beach, CA
Period19/05/0224/05/02

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