Modulated photoellipsometry measurements of GaAs internal field

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A new optical instrument allowing photoellipsometric measurements is presented. Photoellipsometry (PE) is a modulation spectroscopy technique which uses ellipsometry in presence of a chopped external light excitation. PE measurements are obtained using a double modulation system, combining spectroscopic phase-modulated ellipsometry (SPME) with a laser pump beam. The experimental system described here takes advantage of the high frequency polarization of SPME (≈ 50 kHz). As a consequence the frequency of the pump beam can be varied up to 5 kHz. The field- induced changes in the real and imaginary parts of the bulk dielectric function can be directly measured and analyzed in terms of the pump beam power or the probe beam photon energy. Demonstration of this method is made with measurements, recorded in the band-gap E0 region (≈ 1.4 eV), on n-type GaAs sample. In particular, Franz-Keldish oscillations are observed with a very good sensitivity. More generally, PE measurements are compared with a theoretical model. From this preliminary study, it can be concluded that PE appears as a promising technique for semiconductor characterization.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages148-155
Number of pages8
ISBN (Print)0819417440, 9780819417442
DOIs
Publication statusPublished - 1 Jan 1995
EventOptoelectronic Integrated Circuit Materials, Physics, and Devices - San Jose, CA, USA
Duration: 6 Feb 19959 Feb 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2397
ISSN (Print)0277-786X

Conference

ConferenceOptoelectronic Integrated Circuit Materials, Physics, and Devices
CitySan Jose, CA, USA
Period6/02/959/02/95

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