Abstract
We study hydrogen stability and its evolution during thermal annealing in nanostructured amorphous silicon thin films. From the simultaneous measurement of heat and hydrogen desorption, we obtain the experimental evidence of molecular diffusion in these materials. In addition, we introduce a simple diffusion model which shows good agreement with the experimental data.
| Original language | English |
|---|---|
| Article number | 073202 |
| Journal | Physical Review B - Condensed Matter and Materials Physics |
| Volume | 80 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 17 Aug 2009 |
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