MRAM-on-FDSOI Integration: A bit-cell perspective

  • Hao Cai
  • , You Wang
  • , Wang Kang
  • , Lirida Naviner
  • , Xinning Liu
  • , Jun Yang
  • , Weisheng Zhao

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper we discuss the potential foundry announced hybrid integration of magnetic random access memory (MRAM) on fully depleted silicon-on-insulator (FD-SOI) technology. The spin transfer torque magnetic tunnel junction (STT-MTJ) and the next generation voltage-controlled magnetic anisotropy (VCMA) MTJ are separately integrated into a 28 nm FD-SOI process. Circuit-level design strategies are explored that use FD-SOI leverage and spin-device characteristic to realize writing and reading power-delay efficiency, robust and reliable performance in a 1-Transistor 1-MTJ (1T1M) bit cell. Process variation aware strategies for MTJ-FDSOI integration are proposed to compensate failure operations, by using the dynamic step-wise back-bias and the flip-well back-bias. A qualitative summary demonstrates that the MRAM-on-FDSOI integration offers attractive performance for future non-volatile CMOS integration.

Original languageEnglish
Title of host publicationProceedings - 2018 IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2018
PublisherIEEE Computer Society
Pages263-268
Number of pages6
ISBN (Print)9781538670996
DOIs
Publication statusPublished - 7 Aug 2018
Externally publishedYes
Event17th IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2018 - Hong Kong, Hong Kong
Duration: 9 Jul 201811 Jul 2018

Publication series

NameProceedings of IEEE Computer Society Annual Symposium on VLSI, ISVLSI
Volume2018-July
ISSN (Print)2159-3469
ISSN (Electronic)2159-3477

Conference

Conference17th IEEE Computer Society Annual Symposium on VLSI, ISVLSI 2018
Country/TerritoryHong Kong
CityHong Kong
Period9/07/1811/07/18

Keywords

  • Bit cell
  • FDSOI
  • MRAM
  • STT MTJ
  • VCMA MTJ

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