Mueller polarimetry in the back focal plane

A. De Martino, S. Ben Hatit, M. Foldyna

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A new Mueller polarimeter based on liquid crystals and a microscope objective is presented, for the characterization of diffraction gratings in a conical diffraction mounting. Fast measurements of complete Mueller matrices over a range of polar angles (0-56°) and azimuthal angles (0-360°) are achieved without mechanical movements. The polarization state generator and analyzer make use of nematic variable retarders. The angular range is achieved through focalization of light over the measured sample with a microscope objective with a high numerical aperture and imaging of the objective back Fourier plane on a CCD. Results on isotropic samples and diffraction gratings are shown.

Original languageEnglish
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXI
EditionPART 1
DOIs
Publication statusPublished - 15 Oct 2007
EventMetrology, Inspection, and Process Control for Microlithography XXI - San Jose, CA, United States
Duration: 26 Feb 20071 Mar 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
NumberPART 1
Volume6518
ISSN (Print)0277-786X

Conference

ConferenceMetrology, Inspection, and Process Control for Microlithography XXI
Country/TerritoryUnited States
CitySan Jose, CA
Period26/02/071/03/07

Keywords

  • Calibration
  • Conical diffraction
  • Ellipsometry
  • Mueller matrix
  • Polarimetry

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