Multispecies step-flow model of growth of compound thin films by MOCVD

This paper presents a model of step-flow-mediated growth of a multispecies stoichiometric compound in the setting of MOCVD. The gas phase delivers adatoms of the different species to the terraces; these adatoms diffuse along the terraces until they reach the steps where they react to form the compound which is incorporated into the film. The model shows that possible blocking of open sites on the terrace and nonlinear kinetics at the steps give rise to an unusual dependence of the deposition flux (growth rate) on the gas phase composition. A methodology for coupling this step-flow model to reactor-scale gas phase models is also proposed, and shown to be linearly stable.