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Observation of the linear stark effect in a single acceptor in Si

  • Université Paris-Saclay
  • Yale University

Research output: Contribution to journalArticlepeer-review

Abstract

The Stark splitting of a single fourfold degenerate impurity located within the built-in potential of a metal-semiconductor contact is investigated using low temperature transport measurements. A model is developed and used to analyze transport as a function of temperature, bias voltage, and magnetic field. Our data is consistent with a boron impurity. We report g factors of g1/2=1.14 and g3/2=1.72 and a linear Stark splitting 2Δ of 0.1 meV.

Original languageEnglish
Article number096805
JournalPhysical Review Letters
Volume98
Issue number9
DOIs
Publication statusPublished - 2 Mar 2007
Externally publishedYes

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