Abstract
The Stark splitting of a single fourfold degenerate impurity located within the built-in potential of a metal-semiconductor contact is investigated using low temperature transport measurements. A model is developed and used to analyze transport as a function of temperature, bias voltage, and magnetic field. Our data is consistent with a boron impurity. We report g factors of g1/2=1.14 and g3/2=1.72 and a linear Stark splitting 2Δ of 0.1 meV.
| Original language | English |
|---|---|
| Article number | 096805 |
| Journal | Physical Review Letters |
| Volume | 98 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2 Mar 2007 |
| Externally published | Yes |
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