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On the Physical Behavior of Cryogenic IV and III-V Schottky Barrier MOSFET Devices

  • Mike Schwarz
  • , Laurie E. Calvet
  • , John P. Snyder
  • , Tillmann Krauss
  • , Udo Schwalke
  • , Alexander Kloes
  • Robert Bosch GmbH
  • Université Paris-Saclay
  • JCap LLC
  • Technische Universität Darmstadt
  • Technische Hochschule Mittelhessen

Research output: Contribution to journalArticlepeer-review

Abstract

The physical influence of temperature down to the cryogenic regime is analyzed in a comprehensive study and the comparison of IV and III-V Schottky barrier (SB) double-gate MOSFETs. The exploration is done using the Synopsys TCAD Sentaurus device simulator and first benchmarked with experimental data. The important device physics of both SB-MOSFETs and conventional MOSFETs are reviewed. The impact of temperature on device performance down to the liquid-nitrogen regime is then explored. We find reduced drive currents in SB-MOSFETs fabricated on small effective mass materials and that SB lowering can significantly improve SB-MOSFETs, especially at low temperatures.

Original languageEnglish
Article number7995078
Pages (from-to)3808-3815
Number of pages8
JournalIEEE Transactions on Electron Devices
Volume64
Issue number9
DOIs
Publication statusPublished - 1 Sept 2017
Externally publishedYes

Keywords

  • Device modeling
  • III-V MOSFET
  • IV MOSFET
  • double-gate (DG) MOSFET
  • field emission (FE)
  • liquid-nitrogen regime
  • schottky barrier (SB)
  • thermionic and tunneling current
  • thermionic emission (TE)

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