Abstract
Photoinduced processes involving chlorine molecules in synthetic silica were studied. Interstitial Cl<inf>2</inf> in SiO<inf>2</inf> are prevented from VIS/UV photolysis by cage effect. However, they react with oxygen interstitials yielding photosensitive ClClO molecules absorbing at 264nm.
| Original language | English |
|---|---|
| Title of host publication | Bragg Gratings, Photosensitivity and Poling in Glass Waveguides and Materials, BGPPM 2018 |
| Publisher | Optica Publishing Group (formerly OSA) |
| ISBN (Print) | 9781943580439 |
| DOIs | |
| Publication status | Published - 1 Jan 2018 |
| Externally published | Yes |
| Event | Bragg Gratings, Photosensitivity and Poling in Glass Waveguides and Materials, BGPPM 2018 - Zurich, Switzerland Duration: 2 Jul 2018 → 5 Jul 2018 |
Publication series
| Name | Optics InfoBase Conference Papers |
|---|---|
| Volume | Part F98-BGPPM 2018 |
| ISSN (Electronic) | 2162-2701 |
Conference
| Conference | Bragg Gratings, Photosensitivity and Poling in Glass Waveguides and Materials, BGPPM 2018 |
|---|---|
| Country/Territory | Switzerland |
| City | Zurich |
| Period | 2/07/18 → 5/07/18 |