Partial crystallization of an amorphous alloy by electronic energy deposition

  • A. Dunlop
  • , G. Jaskierowicz
  • , G. Rizza
  • , M. Kopcewicz

Research output: Contribution to journalArticlepeer-review

Abstract

Low temperature irradiation of an amorphous Fe73.5Cu1Nb3Si13.5B9 alloy with 5 GeV Pb ions was studied and found to induce local crystallization in the amorphous phase. TEM analysis revealed the formation of iron borides. No evidence for the formation of the Fe(Si) phase was found. Crystallization resulted from the local relaxation of the energy deposited in the target electronic system along the ion trajectory.

Original languageEnglish
Article number015503
Pages (from-to)015503/1-015503/4
JournalPhysical Review Letters
Volume90
Issue number1
Publication statusPublished - 10 Jan 2003

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