Performances and stability of Se/Si multilayers with barrier layers for wavelengths around 46 nm

  • Julien Gautier
  • , Franck Delmotte
  • , Marc Roulliay
  • , Marie Françoise Ravet
  • , Françoise Bridou
  • , Arnaud Jerome
  • , Angelo Giglia
  • , Stefano Nannarone

Research output: Contribution to journalConference articlepeer-review

Abstract

We present an experimental study of aging and thermal stability of Sc/Si multilayers deposited by magnetron sputtering. These multilayers have been characterized by using hard X-ray grazing incidence reflectometry at 0.154 nm and synchrotron radiation reflectometry at near normal incidence. The reflectivity was found to be stable after one year. A maximum reflectivity of 46% has been measured at 46 nm. However a 20% relative decrease of the reflectivity have been observed after one hour thermal annealing at 200°C. In order to improve thermal stability, we studied two different barriers layers (B4C and ScN). We compare the decrease of peak reflectivity and its wavelength shift after one hour annealing at 200°C under argon atmosphere. The best result was observed with the design using 0.3 nm B4C barrier layers. A relative decrease of 2% of the reflectivity peak has been observed with this design as compared to a 20% decrease without barrier layers.

Original languageEnglish
Article number59630X
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5963
DOIs
Publication statusPublished - 1 Dec 2005
Externally publishedYes
EventAdvances in Optical Thin Films II - Jena, Germany
Duration: 13 Sept 200515 Sept 2005

Keywords

  • Multilayers
  • Scandium
  • Thermal stability
  • XUV optics

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