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Plasma devices for focusing extreme light pulses

  • J. Fuchs
  • , A. A. Gonoskov
  • , M. Nakatsutsumi
  • , W. Nazarov
  • , F. Quéré
  • , A. M. Sergeev
  • , X. Q. Yan
  • CEA/UVSQ/CNRS
  • Institute of Applied Physics of the Russian Academy of Sciences
  • Lobachevsky National Research University of Nizhni Novgorod
  • Chalmers University of Technology
  • European XFEL GmbH
  • University of St Andrews
  • Laboratoire Interactions, Dynamique et Lasers, CEA-Saclay
  • State Key Laboratory of Nuclear Physics and Technology

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

Since the inception of the laser, there has been a constant push toward increasing the laser peak intensity, as this has lead to opening the exploration of new territories, and the production of compact sources of particles and radiation with unprecedented characteristics. However, increasing the peak laser intensity is usually performed by enhancing the produced laser properties, either by lowering its duration or increasing its energy, which involves a great level of complexity for the laser chain, or comes at great cost. Focusing tightly is another possibility to increase the laser intensity, but this comes at the risk of damaging the optics with target debris, as it requires their placement in close proximity to the interaction region. Plasma devices are an attractive, compact alternative to tightly focus extreme light pulses and further increase the final laser intensity.

Original languageEnglish
Pages (from-to)1169-1173
Number of pages5
JournalEuropean Physical Journal: Special Topics
Volume223
Issue number6
DOIs
Publication statusPublished - 1 Jan 2014
Externally publishedYes

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