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Polycrystalline silicon films on ceramic substrates by aluminium-induced crystallisation process

  • Centre national de la recherche scientifique

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Growth of polycrystalline silicon layers on ceramic substrates using the aluminium induced crystallisation (AIC) process of amorphous silicon is presented. Alumina and mullite ceramics were used as substrates as well as thermally-oxidized silicon for comparison. We have found a faster layer exchange process and therefore smaller grains in the final continuous poly-Si seed film on mullite and alumina. Raman spectroscopy confirmed the high crystalline quality of this AIC layer. Silicon epitaxy on the AIC seed layers by high temperature CVD is also reported, thanks to the ceramic substrate.

Original languageEnglish
Title of host publicationProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
EditorsK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Pages1182-1185
Number of pages4
Publication statusPublished - 1 Dec 2003
EventProceddings of the 3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Duration: 11 May 200318 May 2003

Publication series

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
VolumeB

Conference

ConferenceProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
Country/TerritoryJapan
CityOsaka
Period11/05/0318/05/03

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