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Process and Device Simulation of Schottky Barrier MOSFETs for Analysis of Current Injection

  • Mike Schwarz
  • , Laurie E. Calvet
  • , John P. Snyder
  • , Tillmann Krauss
  • , Udo Schwalke
  • , Alexander Kloes
  • NanoP
  • Université Paris-Saclay
  • JCap LLC
  • Technische Universität Darmstadt

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper we focus on the implementation of a process flow of SB-MOSFETs into the process simulator of the Synopsys TCAD Sentaurus tool-chain. The improved structure containing topography is briefly discussed and further device simulations are applied with the latest physical models available for these type of devices. Afterwards, some key parameters are discussed and finally the results are compared with fabricated SB-MOSFETs in terms of accuracy and capability of process simulations.

Original languageEnglish
Title of host publicationProceedings of 25th International Conference Mixed Design of Integrated Circuits and Systems, MIXDES 2018
EditorsAndrzej Napieralski
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages67-72
Number of pages6
ISBN (Print)9788363578138
DOIs
Publication statusPublished - 14 Aug 2018
Externally publishedYes
Event25th International Conference "Mixed Design of Integrated Circuits and Systems", MIXDES 2018 - Gdynia, Poland
Duration: 21 Jun 201823 Jun 2018

Publication series

NameProceedings of 25th International Conference Mixed Design of Integrated Circuits and Systems, MIXDES 2018

Conference

Conference25th International Conference "Mixed Design of Integrated Circuits and Systems", MIXDES 2018
Country/TerritoryPoland
CityGdynia
Period21/06/1823/06/18

Keywords

  • 2D Poisson equation
  • MOSFET
  • Schottky barrier
  • Synopsys
  • TCAD
  • device modeling
  • field emission
  • process simulation
  • thermionic emission
  • tunneling current

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