TY - JOUR
T1 - PTFE surface etching in the post-discharge of a scanning RF plasma torch
T2 - Evidence of ejected fluorinated species
AU - Dufour, Thierry
AU - Hubert, Julie
AU - Viville, Pascal
AU - Duluard, Corinne Y.
AU - Desbief, Simon
AU - Lazzaroni, Roberto
AU - Reniers, François
PY - 2012/8/1
Y1 - 2012/8/1
N2 - The texturization of poly(tetrafluoroethylene) (PTFE) surfaces is achieved at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium and oxygen gases. The surface properties are characterized by contact angle measurement, X-ray photoelectron spectroscopy and atomic force microscopy. We show that the plasma treatment increases the surface hydrophobicity (with water contact angles increasing from 115 to 155°) only by modifying the PTFE surface morphology and not the stoichiometry. Measurements of sample mass losses correlated to the ejection of CF 2 fragments from the PTFE surface evidenced an etching mechanism at atmospheric pressure. Poly(tetrafluoroethylene) (PTFE) surfaces have been texturized at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium and oxygen gases. An etching mechanism of the surface has been highlighted by correlating the mass losses measurements to the ejection of CF 2 fragments from the PTFE surface and to an increase in the surface hydrophobicity.
AB - The texturization of poly(tetrafluoroethylene) (PTFE) surfaces is achieved at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium and oxygen gases. The surface properties are characterized by contact angle measurement, X-ray photoelectron spectroscopy and atomic force microscopy. We show that the plasma treatment increases the surface hydrophobicity (with water contact angles increasing from 115 to 155°) only by modifying the PTFE surface morphology and not the stoichiometry. Measurements of sample mass losses correlated to the ejection of CF 2 fragments from the PTFE surface evidenced an etching mechanism at atmospheric pressure. Poly(tetrafluoroethylene) (PTFE) surfaces have been texturized at atmospheric pressure by using the post-discharge of a radio-frequency plasma torch supplied in helium and oxygen gases. An etching mechanism of the surface has been highlighted by correlating the mass losses measurements to the ejection of CF 2 fragments from the PTFE surface and to an increase in the surface hydrophobicity.
KW - PTFE etching
KW - RF plasma torch treatment
KW - hydrophobic surfaces
KW - scanning RF plasma torch
UR - https://www.scopus.com/pages/publications/84862838312
U2 - 10.1002/ppap.201100209
DO - 10.1002/ppap.201100209
M3 - Article
AN - SCOPUS:84862838312
SN - 1612-8850
VL - 9
SP - 820
EP - 829
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 8
ER -