Radiation hardening of silica glass through fictive temperature reduction

Matthieu Lancry; B. Hari Babu; Nadège Ollier; Bertrand Poumellec

doi:10.1111/ijag.12271

Radiation hardening of silica glass through fictive temperature reduction

Matthieu Lancry, B. Hari Babu, Nadège Ollier, Bertrand Poumellec

Research output: Contribution to journal › Article › peer-review

Abstract

The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, T_f, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen(II) defects in high T_f samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.

Original language	English
Pages (from-to)	285-290
Number of pages	6
Journal	International Journal of Applied Glass Science
Volume	8
Issue number	3
DOIs	https://doi.org/10.1111/ijag.12271
Publication status	Published - 1 Sept 2017
Externally published	Yes

Keywords

defects
fiber materials
fictive temperature
radiation resistance
silica

Access to Document

10.1111/ijag.12271

Cite this

@article{3139f8037a954c849b4b8239f372eafb,

title = "Radiation hardening of silica glass through fictive temperature reduction",

abstract = "The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, Tf, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E{\textquoteright} point defects, AlOHC, and hydrogen(II) defects in high Tf samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.",

keywords = "defects, fiber materials, fictive temperature, radiation resistance, silica",

author = "Matthieu Lancry and Babu, \{B. Hari\} and Nad{\`e}ge Ollier and Bertrand Poumellec",

note = "Publisher Copyright: {\textcopyright} 2017 The American Ceramic Society and Wiley Periodicals, Inc",

year = "2017",

month = sep,

day = "1",

doi = "10.1111/ijag.12271",

language = "English",

volume = "8",

pages = "285--290",

journal = "International Journal of Applied Glass Science",

issn = "2041-1286",

number = "3",

}

TY - JOUR

T1 - Radiation hardening of silica glass through fictive temperature reduction

AU - Lancry, Matthieu

AU - Babu, B. Hari

AU - Ollier, Nadège

AU - Poumellec, Bertrand

PY - 2017/9/1

Y1 - 2017/9/1

N2 - The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, Tf, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen(II) defects in high Tf samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.

AB - The aim of this article was to report the effects of γ-radiation on type-I Infrasil silica glass with different fictive temperatures, Tf, for harsh environment applications. Radiation-induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen(II) defects in high Tf samples. In general, we find that the γ-radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.

KW - defects

KW - fiber materials

KW - fictive temperature

KW - radiation resistance

KW - silica

U2 - 10.1111/ijag.12271

DO - 10.1111/ijag.12271

M3 - Article

AN - SCOPUS:85017562508

SN - 2041-1286

VL - 8

SP - 285

EP - 290

JO - International Journal of Applied Glass Science

JF - International Journal of Applied Glass Science

IS - 3

ER -

Radiation hardening of silica glass through fictive temperature reduction

Abstract

Keywords

Access to Document

Fingerprint

Cite this