Radical addition to vinyl sulphones and vinyl phosphonium salts

Derek H.R. Barton; Hideo Togo; Samir Z. Zard

doi:10.1016/S0040-4039(01)84596-2

Radical addition to vinyl sulphones and vinyl phosphonium salts

Derek H.R. Barton
, Hideo Togo
, Samir Z. Zard

Institut de Chimie des Substances Naturelles

Research output: Contribution to journal › Article › peer-review

Abstract

Alkyl radicals, derived from decarboxylation of carboxylic acids, add readily to phenyl vinyl sulphone and vinyl phosphonium bromide. The adducts may be further converted into a variety of useful synthetic intermediates.

Original language	English
Pages (from-to)	6349-6352
Number of pages	4
Journal	Tetrahedron Letters
Volume	26
Issue number	51
DOIs	https://doi.org/10.1016/S0040-4039(01)84596-2
Publication status	Published - 1 Jan 1985
Externally published	Yes

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title = "Radical addition to vinyl sulphones and vinyl phosphonium salts",

abstract = "Alkyl radicals, derived from decarboxylation of carboxylic acids, add readily to phenyl vinyl sulphone and vinyl phosphonium bromide. The adducts may be further converted into a variety of useful synthetic intermediates.",

author = "Barton, \{Derek H.R.\} and Hideo Togo and Zard, \{Samir Z.\}",

year = "1985",

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journal = "Tetrahedron Letters",

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AU - Togo, Hideo

AU - Zard, Samir Z.

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N2 - Alkyl radicals, derived from decarboxylation of carboxylic acids, add readily to phenyl vinyl sulphone and vinyl phosphonium bromide. The adducts may be further converted into a variety of useful synthetic intermediates.

AB - Alkyl radicals, derived from decarboxylation of carboxylic acids, add readily to phenyl vinyl sulphone and vinyl phosphonium bromide. The adducts may be further converted into a variety of useful synthetic intermediates.

U2 - 10.1016/S0040-4039(01)84596-2

DO - 10.1016/S0040-4039(01)84596-2

M3 - Article

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VL - 26

SP - 6349

EP - 6352

JO - Tetrahedron Letters

JF - Tetrahedron Letters

IS - 51

ER -

Radical addition to vinyl sulphones and vinyl phosphonium salts

Abstract

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