Relative intensity noise of silicon-based quantum dot lasers

  • J. Duan
  • , H. Huang
  • , D. Jung
  • , J. C. Norman
  • , J. E. Bowers
  • , F. Grillot

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This work experimentally investigates the relative intensity noise (RIN) of semiconductor quantum dot (QD) lasers epitaxially grown on silicon. Owing to the low threading dislocations density and the p-modulation doped GaAs barrier layer in the active region, a RIN level as low as -150 dB/Hz at 9 GHz is demonstrated. The results show that the p-doping decreases the high-frequency RIN and the damping factor. In the latter, a damping factor up to 30 GHz at three times the threshold is extracted from the RIN spectrum along with a K-factor of 1.7 ns. These results pave the way for high speed and low noise QD devices for future integrated photonics technologies.

Original languageEnglish
Title of host publication2019 Compound Semiconductor Week, CSW 2019 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728100807
DOIs
Publication statusPublished - 1 May 2019
Externally publishedYes
Event2019 Compound Semiconductor Week, CSW 2019 - Nara, Japan
Duration: 19 May 201923 May 2019

Publication series

Name2019 Compound Semiconductor Week, CSW 2019 - Proceedings

Conference

Conference2019 Compound Semiconductor Week, CSW 2019
Country/TerritoryJapan
CityNara
Period19/05/1923/05/19

Keywords

  • Quantum dot lasers
  • Relative intensity noise

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