Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments

F. Kail; J. Farjas; P. Roura; C. Secouard; O. Nos; J. Bertomeu; F. Alzina; P. Roca I Cabarrocas

doi:10.1063/1.3464961

Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments

F. Kail
, J. Farjas
, P. Roura
, C. Secouard
, O. Nos
, J. Bertomeu
, F. Alzina
, P. Roca I Cabarrocas

GRMT, Department of Physics
University of Girona
Univ. Joseph Fourier-Grenoble 1
Univ. Barcelona
University of Barcelona
Inst. de Cie. de Mat. de Barcelona
University of São Paulo

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

The structural relaxation of pure amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) materials, that occurs during thermal annealing experiments, has been analyzed by Raman spectroscopy and differential scanning calorimetry. Unlike a-Si, the heat evolved from a-Si:H cannot be explained by relaxation of the Si-Si network strain but it reveals a derelaxation of the bond angle strain. Since the state of relaxation after annealing is very similar for pure and hydrogenated materials, our results give strong experimental support to the predicted configurational gap between a-Si and crystalline silicon.

Original language	English
Article number	031918
Journal	Applied Physics Letters
Volume	97
Issue number	3
DOIs	https://doi.org/10.1063/1.3464961
Publication status	Published - 19 Jul 2010

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10.1063/1.3464961

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title = "Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments",

abstract = "The structural relaxation of pure amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) materials, that occurs during thermal annealing experiments, has been analyzed by Raman spectroscopy and differential scanning calorimetry. Unlike a-Si, the heat evolved from a-Si:H cannot be explained by relaxation of the Si-Si network strain but it reveals a derelaxation of the bond angle strain. Since the state of relaxation after annealing is very similar for pure and hydrogenated materials, our results give strong experimental support to the predicted configurational gap between a-Si and crystalline silicon.",

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T1 - Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments

AU - Kail, F.

AU - Farjas, J.

AU - Roura, P.

AU - Secouard, C.

AU - Nos, O.

AU - Bertomeu, J.

AU - Alzina, F.

AU - Roca I Cabarrocas, P.

PY - 2010/7/19

Y1 - 2010/7/19

N2 - The structural relaxation of pure amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) materials, that occurs during thermal annealing experiments, has been analyzed by Raman spectroscopy and differential scanning calorimetry. Unlike a-Si, the heat evolved from a-Si:H cannot be explained by relaxation of the Si-Si network strain but it reveals a derelaxation of the bond angle strain. Since the state of relaxation after annealing is very similar for pure and hydrogenated materials, our results give strong experimental support to the predicted configurational gap between a-Si and crystalline silicon.

AB - The structural relaxation of pure amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si:H) materials, that occurs during thermal annealing experiments, has been analyzed by Raman spectroscopy and differential scanning calorimetry. Unlike a-Si, the heat evolved from a-Si:H cannot be explained by relaxation of the Si-Si network strain but it reveals a derelaxation of the bond angle strain. Since the state of relaxation after annealing is very similar for pure and hydrogenated materials, our results give strong experimental support to the predicted configurational gap between a-Si and crystalline silicon.

U2 - 10.1063/1.3464961

DO - 10.1063/1.3464961

M3 - Article

AN - SCOPUS:77956214958

SN - 0003-6951

VL - 97

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 3

M1 - 031918

ER -

Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experiments

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