Self-Supervised Dual Contouring

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Learning-based isosurface extraction methods have recently emerged as a robust and efficient alternative to axiomatic techniques. However, the vast majority of such approaches rely on supervised training with axiomatically computed ground truths, thus potentially inheriting biases and data artefacts of the corresponding axiomatic methods. Steering away from such dependencies, we propose a self-supervised training scheme to the Neural Dual Contouring meshing framework, resulting in our method: SelfSupervised Dual Contouring (SDC). Instead of optimizing predicted mesh vertices with supervised training, we use two novel self-supervised loss functions that encourage the consistency between distances to the generated mesh up to the first order. Meshes reconstructed by SDC surpass existing data-driven methods in capturing intricate details while being more robust to possible irregularities in the input. Furthermore, we use the same self-supervised training objective linking inferred mesh and input SDF, to regularize the training process of Deep Implicit Networks (DINs). We demonstrate that the resulting DINs produce higher-quality implicit functions, ultimately leading to more accurate and detail-preserving surfaces compared to prior baselines for different input modalities. Finally, we demonstrate that our self-supervised losses improve meshing performance in the single-view reconstruction task by enabling joint training of predicted SDF and resulting output mesh. We open-source our code at https://github.com/Sentient07/SDC.

Original languageEnglish
Title of host publicationProceedings - 2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition, CVPR 2024
PublisherIEEE Computer Society
Pages4681-4691
Number of pages11
ISBN (Electronic)9798350353006
DOIs
Publication statusPublished - 1 Jan 2024
Externally publishedYes
Event2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition, CVPR 2024 - Seattle, United States
Duration: 16 Jun 202422 Jun 2024

Publication series

NameProceedings of the IEEE Computer Society Conference on Computer Vision and Pattern Recognition
ISSN (Print)1063-6919

Conference

Conference2024 IEEE/CVF Conference on Computer Vision and Pattern Recognition, CVPR 2024
Country/TerritoryUnited States
CitySeattle
Period16/06/2422/06/24

Keywords

  • Meshing

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