Shallow traps and positron dynamics in epitaxial silicon carbide

  • D. T. Britton
  • , M. F. Barthe
  • , C. Corbel
  • , P. Desgardin
  • , W. Egger
  • , P. Sperr
  • , G. Kögel
  • , W. Triftshäuser

Research output: Contribution to journalConference articlepeer-review

Abstract

We have used slow positron beam-based positron lifetime spectroscopy to study positron diffusion in thick epitaxial n-type 6H-SiC layers. The layers are considerably thicker than the maximum positron penetration depth, and can therefore, be treated as homogeneous semi-infinite bulk material in an analysis including the time-dependent diffusion of a single group of probe particles. Temperature-dependent measurements show a reduction in positron diffusion at low temperatures, which has been interpreted by an increase in trapping to negatively charged defect states.

Original languageEnglish
Pages (from-to)122-126
Number of pages5
JournalApplied Surface Science
Volume194
Issue number1-4
DOIs
Publication statusPublished - 21 Jun 2002
Event9th International Workshop on Slow Positron Beam Techniques - Dresden, Germany
Duration: 16 Sept 200122 Sept 2001

Keywords

  • Diffusion
  • Native defects
  • Positron lifetime
  • SiC
  • Trapping

Fingerprint

Dive into the research topics of 'Shallow traps and positron dynamics in epitaxial silicon carbide'. Together they form a unique fingerprint.

Cite this