Shot-to-shot intensity and wavefront stability of high-harmonic generation

  • S. Künzel
  • , G. O. Williams
  • , W. Boutu
  • , E. Galtier
  • , B. Barbrel
  • , H. J. Lee
  • , B. Nagler
  • , U. Zastrau
  • , G. Dovillaire
  • , R. W. Lee
  • , H. Merdji
  • , Ph Zeitoun
  • , M. Fajardo

Research output: Contribution to journalArticlepeer-review

Abstract

We report on the shot-to-shot stability of intensity and spatial phase of high-harmonic generation (HHG). The intensity stability is measured for each high-harmonic (HH) order with a spectrometer. Additionally, the spatial phase is measured with an XUV wavefront sensor for a single HH order measured in a single shot, which according to our knowledge was not reported before with a Hartmann wavefront sensor. Furthermore, we compare the single-shot measurement of the spatial phase with time-integrated measurements and we show that the XUV wavefront sensor is a useful tool to simultaneously optimize the spatial phase and intensity of HHG within the available HHG parameter range used in this study.

Original languageEnglish
Pages (from-to)4745-4749
Number of pages5
JournalApplied Optics
Volume54
Issue number15
DOIs
Publication statusPublished - 20 May 2015

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