Abstract
We report on the shot-to-shot stability of intensity and spatial phase of high-harmonic generation (HHG). The intensity stability is measured for each high-harmonic (HH) order with a spectrometer. Additionally, the spatial phase is measured with an XUV wavefront sensor for a single HH order measured in a single shot, which according to our knowledge was not reported before with a Hartmann wavefront sensor. Furthermore, we compare the single-shot measurement of the spatial phase with time-integrated measurements and we show that the XUV wavefront sensor is a useful tool to simultaneously optimize the spatial phase and intensity of HHG within the available HHG parameter range used in this study.
| Original language | English |
|---|---|
| Pages (from-to) | 4745-4749 |
| Number of pages | 5 |
| Journal | Applied Optics |
| Volume | 54 |
| Issue number | 15 |
| DOIs | |
| Publication status | Published - 20 May 2015 |
Fingerprint
Dive into the research topics of 'Shot-to-shot intensity and wavefront stability of high-harmonic generation'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver