Abstract
The development of field-effect devices induced a demand for very fine, high-aspect-ratio tips, suitable for scanning tunneling and force microscopy and field-effect emitter arrays. Silicon pyramidal structures field emitter array (Si-FEA) was fabricated using pure thermal silicon dioxide as a mask for selective etch. Based on a new technology of carbon nanotubes selective growth on the tip of silicon pyramidal structures the emission efficiency of the processed silicon tips could be increased. The paper present first results of this technology.
| Original language | English |
|---|---|
| Pages | 97-100 |
| Number of pages | 4 |
| Publication status | Published - 1 Jan 2004 |
| Externally published | Yes |
| Event | 27th International Semiconductor Conference, CAS 2004 - Sinaia, Romania Duration: 4 Oct 2004 → 6 Oct 2004 |
Conference
| Conference | 27th International Semiconductor Conference, CAS 2004 |
|---|---|
| Country/Territory | Romania |
| City | Sinaia |
| Period | 4/10/04 → 6/10/04 |
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