Size influence on the propagation loss induced by sidewall roughness in ultrasmall SOI waveguides

Frederic Grillot, L. Vivien, S. Laval, D. Pascal, E. Cassan

Research output: Contribution to journalArticlepeer-review

Abstract

Silicon-on-insulator (SOI) optical waveguides with high electromagnetic field confinement suffer from sidewall roughness which is responsible for strong scattering effects. This letter reports a numerical investigation on the size influence of ultrasmall SOI waveguides on the propagation loss due to sidewall roughness. It is shown that for a size smaller than 260 × 260 nm the roughness-induced propagation loss decreases. As the optical mode confinement is reduced, a very low loss light coupling from and to a single-mode fiber can be achieved with propagation loss as low as 0.5 dB/cm for a 150 × 150 nm cross-sectional waveguide.

Original languageEnglish
Pages (from-to)1661-1663
Number of pages3
JournalIEEE Photonics Technology Letters
Volume16
Issue number7
DOIs
Publication statusPublished - 1 Jul 2004
Externally publishedYes

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