Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma

J. P. Booth; G. Hancock; N. D. Perry; M. J. Toogood

doi:10.1063/1.343712

Spatially and temporally resolved laser-induced fluorescence measurements of CF₂ and CF radicals in a CF₄ rf plasma

J. P. Booth
, G. Hancock
, N. D. Perry
, M. J. Toogood

University of Oxford

Research output: Contribution to journal › Article › peer-review

Abstract

Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF₂ and CF radicals in a CF₄ plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF₂ and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF₂.

Original language	English
Pages (from-to)	5251-5257
Number of pages	7
Journal	Journal of Applied Physics
Volume	66
Issue number	11
DOIs	https://doi.org/10.1063/1.343712
Publication status	Published - 1 Jan 1989
Externally published	Yes

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10.1063/1.343712

Cite this

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title = "Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma",

abstract = "Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF2 and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF2.",

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AU - Booth, J. P.

AU - Hancock, G.

AU - Perry, N. D.

AU - Toogood, M. J.

PY - 1989/1/1

Y1 - 1989/1/1

N2 - Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF2 and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF2.

AB - Laser-induced fluorescence has been used to examine the temporal behavior of ground-state CF2 and CF radicals in a CF4 plasma etching reactor. We also report the measured spatial dependencies of the radical concentrations, and develop a rigorous model for their interpretation. The results indicate that for CF2 and CF, wall removal processes are dominant at low pressures of the order of 50 mTorr, and that CF is not produced by electron impact dissociation of CF2.

U2 - 10.1063/1.343712

DO - 10.1063/1.343712

M3 - Article

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JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 11

ER -

Spatially and temporally resolved laser-induced fluorescence measurements of CF2 and CF radicals in a CF4 rf plasma

Abstract

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Spatially and temporally resolved laser-induced fluorescence measurements of CF₂ and CF radicals in a CF₄ rf plasma