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Spin injection from a ferromagnetic metal into a semiconductor

  • Unité Mixte de Physique CNRS/Thales
  • Université Paris-Saclay

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)

Abstract

We calculate the spin polarization of electrons injected from a ferromagnetic metal (F) into a semiconductor (SC) or a two-dimensional semiconductor electron gas (2-DEG) and the resulting magnetoresistance (MR) of a F/SC/F structure. Due to the conductivity mismatch between F and SC, efficient spin-injection can be obtained only by inserting a tunnel junction at the F/N interfaces. We find that a F 1/SF/F 2 structure can present a nonzero MR if the junction resistance is chosen in a relatively narrow range determined by the spin-diffusion length and resistivity of F and SC, the distance between the ferromagnets and the width of the conduction channels. The case of a 2-DEG is particularly favorable.

Original languageEnglish
Pages (from-to)8111-8113
Number of pages3
JournalJournal of Applied Physics
Volume91
Issue number10 I
DOIs
Publication statusPublished - 15 May 2002
Externally publishedYes

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