Study of muon pair production from positron annihilation at threshold energy

  • N. Amapane
  • , M. Antonelli
  • , F. Anulli
  • , G. Ballerini
  • , L. Bandiera
  • , N. Bartosik
  • , M. Bauce
  • , A. Bertolin
  • , C. Biino
  • , O. R. Blanco-Garcia
  • , M. Boscolo
  • , C. Brizzolari
  • , A. Cappati
  • , M. Casarsa
  • , G. Cavoto
  • , F. Collamati
  • , G. Cotto
  • , C. Curatolo
  • , R. Di Nardo
  • , F. Gonella
  • S. Hoh, M. Iafrati, F. Iacoangeli, B. Kiani, D. Lucchesi, V. Mascagna, A. Paccagnella, N. Pastrone, J. Pazzini, M. Pelliccioni, B. Ponzio, M. Prest, M. Ricci, R. Rossin, M. Rotondo, O. Sans Planell, L. Sestini, M. Soldani, A. Triossi, E. Vallazza, S. Ventura, M. Zanetti

Research output: Contribution to journalArticlepeer-review

Abstract

The muon collider represents one of the most promising solutions for a future machine exploring the high energy frontier, but several challenges due to the 2.2 μsec muon lifetime at rest have to be carefully considered. The LEMMA project is investigating the possibility of producing low emittance muon/antimuon pairs from the e+e- annihilation process at threshold energy, resulting in small transverse emittance beams without any additional beam cooling. However most of the measurements available are performed at higher s values. It is therefore necessary to measure muons production in positron annihilation at threshold energy and compare the experimental results with the predictions in this specific energy regime. Apart from being a topic of physical interest by itself, these near to threshold measurements can have a sizeable impact on the estimation of the ultimate luminosity achievable in a muon collider with the LEMMA injection scheme.

Original languageEnglish
Article numberP01036
JournalJournal of Instrumentation
Volume15
Issue number1
DOIs
Publication statusPublished - 29 Jan 2020
Externally publishedYes

Keywords

  • Accelerator Subsystems and Technologies
  • Beam-line instrumentation (beam position and profile monitors
  • Muon spectrometers
  • beam-intensity monitors
  • bunch length monitors)

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