Study of pm-SiGe:H thin films for p-i-n devices and tandem solar cells

M. E. Gueunier, J. P. Kleider, P. Chatterjee, P. Roca i Cabarrocas, Y. Poissant

Research output: Contribution to journalConference articlepeer-review

Abstract

Polymorphous silicon-germanium (pm-SiGe:H) thin films with Ge contents varying from 1 to 35% were fabricated by plasma enhanced chemical vapour deposition in a high pressure range (1350 mtorr) and under high hydrogen dilution. The electrical and optical properties of these films were studied using a set of complementary techniques. These materials were then incorporated in the i layer of p-i-n solar cells. The performance of such solar cells and the use of these pm-SiGe alloys as the bottom cell of tandem pm-Si:H/pm-SiGe:H cells are finally discussed with the help of numerical simulations.

Original languageEnglish
Pages (from-to)247-251
Number of pages5
JournalThin Solid Films
Volume427
Issue number1-2
DOIs
Publication statusPublished - 3 Mar 2003
EventE-MRS, K - Strasbourg, France
Duration: 18 Jun 200321 Jun 2003

Keywords

  • Silicon-germanium alloys
  • Simulation
  • Solar cells

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