Abstract
Polymorphous silicon-germanium (pm-SiGe:H) thin films with Ge contents varying from 1 to 35% were fabricated by plasma enhanced chemical vapour deposition in a high pressure range (1350 mtorr) and under high hydrogen dilution. The electrical and optical properties of these films were studied using a set of complementary techniques. These materials were then incorporated in the i layer of p-i-n solar cells. The performance of such solar cells and the use of these pm-SiGe alloys as the bottom cell of tandem pm-Si:H/pm-SiGe:H cells are finally discussed with the help of numerical simulations.
| Original language | English |
|---|---|
| Pages (from-to) | 247-251 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 427 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 3 Mar 2003 |
| Event | E-MRS, K - Strasbourg, France Duration: 18 Jun 2003 → 21 Jun 2003 |
Keywords
- Silicon-germanium alloys
- Simulation
- Solar cells