Abstract
This work describes a study performed on pm-Si:H PIN and NIP structures, deposited by PECVD. We show the effect of light-soaking (AM1.5) on pm-Si:H thin films structures optical properties. We propose a model for long range diffusion of hydrogen through the whole device. From the evolution of Raman spectra after annealing, we show that this long range motion of hydrogen causes a hydrogen rearrangement on the film along with a shift on the exodiffusion peaks explaining the degradation process in this type of devices. As a result we determined that for the PIN structure a hydrogen diffusion barrier is generated by defects, which causes a less degradation of its optoelectronic properties under illumination, and a more stable device during operation is expected.
| Original language | English |
|---|---|
| Title of host publication | 2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014 |
| Publisher | Institute of Electrical and Electronics Engineers Inc. |
| Pages | 737-741 |
| Number of pages | 5 |
| ISBN (Electronic) | 9781479943982 |
| DOIs | |
| Publication status | Published - 15 Oct 2014 |
| Event | 40th IEEE Photovoltaic Specialist Conference, PVSC 2014 - Denver, United States Duration: 8 Jun 2014 → 13 Jun 2014 |
Publication series
| Name | 2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014 |
|---|
Conference
| Conference | 40th IEEE Photovoltaic Specialist Conference, PVSC 2014 |
|---|---|
| Country/Territory | United States |
| City | Denver |
| Period | 8/06/14 → 13/06/14 |
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
Keywords
- Photovoltaic structures
- polymorphous silicon
- raman
- spectroscopic ellipsometry
- thin films
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