Study of transport, trapping and recombination mechanisms in microcrystalline silicon by transient photoconductivity

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Abstract

We have studied different sets of microcrystalline silicon films deposited by PECVD and plasma assisted HWCVD at different thicknesses and microstructures. Measurements by time-resolved microwave conductivity (TRMC) give a mobility μTRMC, diffusion-induced mobility μDTRMC and field effect mobility μFE. At high carrier density, the dependence of the TRMC signal on carrier density is sublinear, with slope γ, indicating dominance of shallow trap recombinations. The decay of the signal shows two slopes τ1 and τ2. From the analysis of μTRMC, μDTRMC, μFE, γ, τ1 and τ2 for different samples, we discuss the contribution of grains, grain boundaries, and column boundaries to the mobility, to the fast recombination process, and to the lifetime.

Original languageEnglish
Pages (from-to)336-340
Number of pages5
JournalJournal of Non-Crystalline Solids
Volume338-340
Issue number1 SPEC. ISS.
DOIs
Publication statusPublished - 15 Jun 2004

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