Study of XUV beam splitter flatness for use on a Michelson interferometer

Anne Sophie Morlens; Philippe Zeitoun; Laurent Vanbostal; Pascal Mercere; Grégory Faivre; Sébastien Hubert; Philippe Troussel; Christian Remond; Rémy Marmoret; Franck Delmotte; Marie Françoise Ravet; Marc Rouillay

doi:10.1017/S0263034604223114

Study of XUV beam splitter flatness for use on a Michelson interferometer

Anne Sophie Morlens
, Philippe Zeitoun
, Laurent Vanbostal
, Pascal Mercere
, Grégory Faivre
, Sébastien Hubert
, Philippe Troussel
, Christian Remond
, Rémy Marmoret
, Franck Delmotte
, Marie Françoise Ravet
, Marc Rouillay

Research output: Contribution to journal › Article › peer-review

Abstract

A XUV Michelson interferometer has been developed by LIXAM/CEA/LCFIO and has been tested as a Fourier-transform spectrometer for measurement of X-ray laser line shape. The observed strong deformation of the interference fringes limited the interest of such an interferometer for plasma probing. Because the fringe deformation was coming from a distortion of the beam splitter (5 × 5 mm² open aperture, about 150 nm thick), several parameters of the multilayer deposition used for the beam splitter fabrication have been recently optimized. The flatness has been improved from 80 nm rms obtained by using the ion beam sputtering technique, to 20 nm rms by using the magnetron sputtering technique. Over 3 × 3 mm², the beam splitter has a flatness better than 4 nm rms.

Original language	English
Pages (from-to)	279-284
Number of pages	6
Journal	Laser and Particle Beams
Volume	22
Issue number	3
DOIs	https://doi.org/10.1017/S0263034604223114
Publication status	Published - 1 Sept 2004

Keywords

Fourier-transform spectroscopy
XUV Michelson interferometry
XUV beam splitter

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10.1017/S0263034604223114

Cite this

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title = "Study of XUV beam splitter flatness for use on a Michelson interferometer",

abstract = "A XUV Michelson interferometer has been developed by LIXAM/CEA/LCFIO and has been tested as a Fourier-transform spectrometer for measurement of X-ray laser line shape. The observed strong deformation of the interference fringes limited the interest of such an interferometer for plasma probing. Because the fringe deformation was coming from a distortion of the beam splitter (5 × 5 mm2 open aperture, about 150 nm thick), several parameters of the multilayer deposition used for the beam splitter fabrication have been recently optimized. The flatness has been improved from 80 nm rms obtained by using the ion beam sputtering technique, to 20 nm rms by using the magnetron sputtering technique. Over 3 × 3 mm2, the beam splitter has a flatness better than 4 nm rms.",

keywords = "Fourier-transform spectroscopy, XUV Michelson interferometry, XUV beam splitter",

author = "Morlens, \{Anne Sophie\} and Philippe Zeitoun and Laurent Vanbostal and Pascal Mercere and Gr{\'e}gory Faivre and S{\'e}bastien Hubert and Philippe Troussel and Christian Remond and R{\'e}my Marmoret and Franck Delmotte and Ravet, \{Marie Fran{\c c}oise\} and Marc Rouillay",

year = "2004",

month = sep,

day = "1",

doi = "10.1017/S0263034604223114",

language = "English",

volume = "22",

pages = "279--284",

journal = "Laser and Particle Beams",

issn = "0263-0346",

number = "3",

}

TY - JOUR

T1 - Study of XUV beam splitter flatness for use on a Michelson interferometer

AU - Morlens, Anne Sophie

AU - Zeitoun, Philippe

AU - Vanbostal, Laurent

AU - Mercere, Pascal

AU - Faivre, Grégory

AU - Hubert, Sébastien

AU - Troussel, Philippe

AU - Remond, Christian

AU - Marmoret, Rémy

AU - Delmotte, Franck

AU - Ravet, Marie Françoise

AU - Rouillay, Marc

PY - 2004/9/1

Y1 - 2004/9/1

N2 - A XUV Michelson interferometer has been developed by LIXAM/CEA/LCFIO and has been tested as a Fourier-transform spectrometer for measurement of X-ray laser line shape. The observed strong deformation of the interference fringes limited the interest of such an interferometer for plasma probing. Because the fringe deformation was coming from a distortion of the beam splitter (5 × 5 mm2 open aperture, about 150 nm thick), several parameters of the multilayer deposition used for the beam splitter fabrication have been recently optimized. The flatness has been improved from 80 nm rms obtained by using the ion beam sputtering technique, to 20 nm rms by using the magnetron sputtering technique. Over 3 × 3 mm2, the beam splitter has a flatness better than 4 nm rms.

AB - A XUV Michelson interferometer has been developed by LIXAM/CEA/LCFIO and has been tested as a Fourier-transform spectrometer for measurement of X-ray laser line shape. The observed strong deformation of the interference fringes limited the interest of such an interferometer for plasma probing. Because the fringe deformation was coming from a distortion of the beam splitter (5 × 5 mm2 open aperture, about 150 nm thick), several parameters of the multilayer deposition used for the beam splitter fabrication have been recently optimized. The flatness has been improved from 80 nm rms obtained by using the ion beam sputtering technique, to 20 nm rms by using the magnetron sputtering technique. Over 3 × 3 mm2, the beam splitter has a flatness better than 4 nm rms.

KW - Fourier-transform spectroscopy

KW - XUV Michelson interferometry

KW - XUV beam splitter

U2 - 10.1017/S0263034604223114

DO - 10.1017/S0263034604223114

M3 - Article

AN - SCOPUS:10044228263

SN - 0263-0346

VL - 22

SP - 279

EP - 284

JO - Laser and Particle Beams

JF - Laser and Particle Beams

IS - 3

ER -

Study of XUV beam splitter flatness for use on a Michelson interferometer

Abstract

Keywords

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