Sub-5 nm FIB direct patterning of nanodevices

J. Gierak; A. Madouri; A. L. Biance; E. Bourhis; G. Patriarche; C. Ulysse; D. Lucot; X. Lafosse; L. Auvray; L. Bruchhaus; R. Jede

doi:10.1016/j.mee.2007.01.059

Sub-5 nm FIB direct patterning of nanodevices

J. Gierak
, A. Madouri
, A. L. Biance
, E. Bourhis
, G. Patriarche
, C. Ulysse
, D. Lucot
, X. Lafosse
, L. Auvray
, L. Bruchhaus
, R. Jede

Centre de Nanosciences et de Nanotechnologies
Université d'Evry Val d'Essonne
Raith GmbH

Research output: Contribution to journal › Article › peer-review

137 Citations (Scopus)

Abstract

Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument.

Original language	English
Pages (from-to)	779-783
Number of pages	5
Journal	Microelectronic Engineering
Volume	84
Issue number	5-8
DOIs	https://doi.org/10.1016/j.mee.2007.01.059
Publication status	Published - 1 May 2007
Externally published	Yes

Keywords

Focused ion beam
Quantum dots
Selective epitaxy

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10.1016/j.mee.2007.01.059

Cite this

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title = "Sub-5 nm FIB direct patterning of nanodevices",

abstract = "Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument.",

keywords = "Focused ion beam, Quantum dots, Selective epitaxy",

author = "J. Gierak and A. Madouri and Biance, \{A. L.\} and E. Bourhis and G. Patriarche and C. Ulysse and D. Lucot and X. Lafosse and L. Auvray and L. Bruchhaus and R. Jede",

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TY - JOUR

T1 - Sub-5 nm FIB direct patterning of nanodevices

AU - Gierak, J.

AU - Madouri, A.

AU - Biance, A. L.

AU - Bourhis, E.

AU - Patriarche, G.

AU - Ulysse, C.

AU - Lucot, D.

AU - Lafosse, X.

AU - Auvray, L.

AU - Bruchhaus, L.

AU - Jede, R.

PY - 2007/5/1

Y1 - 2007/5/1

N2 - Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument.

AB - Nanoengraving of membranes as a template for nanopores fabrication is an application field of growing interest. Similarly to the formation of ion tracks in membranes created when high-energetic ions pass trough thin foils, it is possible with a FIB system to fabricate, design and organise nanodevices within thin membranes. In this work, we detail the advanced methodology we have carefully optimised for such deep sub-10 nm nanodevices fabrication using our high-performance FIB instrument.

KW - Focused ion beam

KW - Quantum dots

KW - Selective epitaxy

U2 - 10.1016/j.mee.2007.01.059

DO - 10.1016/j.mee.2007.01.059

M3 - Article

AN - SCOPUS:34247551279

SN - 0167-9317

VL - 84

SP - 779

EP - 783

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 5-8

ER -

Sub-5 nm FIB direct patterning of nanodevices

Abstract

Keywords

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