Surface chemistry and growth modes in the photochemical deposition of silica films

C. Licoppe; Y. I. Nissim; J. M. Moison

doi:10.1103/PhysRevB.45.6275

Surface chemistry and growth modes in the photochemical deposition of silica films

C. Licoppe, Y. I. Nissim, J. M. Moison

Orange Labs

Research output: Contribution to journal › Article › peer-review

Abstract

Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.

Original language	English
Pages (from-to)	6275-6278
Number of pages	4
Journal	Physical Review B
Volume	45
Issue number	11
DOIs	https://doi.org/10.1103/PhysRevB.45.6275
Publication status	Published - 1 Jan 1992
Externally published	Yes

Access to Document

10.1103/PhysRevB.45.6275

Cite this

@article{93c444d1df294c14942b1f4a2f276580,

title = "Surface chemistry and growth modes in the photochemical deposition of silica films",

abstract = "Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.",

author = "C. Licoppe and Nissim, \{Y. I.\} and Moison, \{J. M.\}",

year = "1992",

month = jan,

day = "1",

doi = "10.1103/PhysRevB.45.6275",

language = "English",

volume = "45",

pages = "6275--6278",

journal = "Physical Review B",

issn = "0163-1829",

number = "11",

}

TY - JOUR

T1 - Surface chemistry and growth modes in the photochemical deposition of silica films

AU - Licoppe, C.

AU - Nissim, Y. I.

AU - Moison, J. M.

PY - 1992/1/1

Y1 - 1992/1/1

N2 - Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.

AB - Local surface chemistry and nonlocal deposition modes in the photodeposition of silica films from silane and oxygen mixtures have been studied by surface-sensitive infrared vibrational spectroscopy. The two-step surface reaction leading to the photoinduced chemisorption of silane and oxygen is identified. Dynamic roughening of the growth front is shown to occur with a characteristic exponent of 0.340.05, fitting the Kardar-Parisi-Zhang model.

U2 - 10.1103/PhysRevB.45.6275

DO - 10.1103/PhysRevB.45.6275

M3 - Article

AN - SCOPUS:0346493375

SN - 0163-1829

VL - 45

SP - 6275

EP - 6278

JO - Physical Review B

JF - Physical Review B

IS - 11

ER -

Surface chemistry and growth modes in the photochemical deposition of silica films

Abstract

Access to Document

Fingerprint

Cite this