Abstract
Carbon nitride films raise current interest for their potential applications as ultra-hard materials. We report on the formation of crystalline CN structures in films deposited at 248 nm on different substrates (sapphire, quartz, alumina) using the laser-induced CVD method and a gas mixture containing ethylene/nitrous oxide and ammonia as carbon and nitrogen source, respectively. The structural and morphological properties of the films were characterized by different analytical techniques (SEM, TEM, TED and XPS).
| Original language | English |
|---|---|
| Pages (from-to) | 413-418 |
| Number of pages | 6 |
| Journal | Materials Research Society Symposium - Proceedings |
| Volume | 555 |
| Publication status | Published - 1 Jan 1999 |
| Externally published | Yes |
| Event | Proceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' - Boston, MA, USA Duration: 30 Nov 1998 → 3 Dec 1998 |
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