Tensile-strained germanium microdisks using Si3N4 stressors

M. El Kurdi, A. Ghrib, M. De Kersauson, M. Prost, S. Sauvage, X. Checoury, G. Beaudoin, I. Sagnes, G. Ndong, M. Chaigneau, R. Ossikovski, P. Boucaud

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A strong tensile strain (1% biaxial) is applied to germanium microdisks using silicon nitride stressors. Both Fabry-Perot and whispering gallery modes are observed with quality factors up to 1350 limited by free carrier absorption.

Original languageEnglish
Title of host publication2013 IEEE 10th International Conference on Group IV Photonics, GFP 2013
Pages95-96
Number of pages2
DOIs
Publication statusPublished - 31 Dec 2013
Event2013 IEEE 10th International Conference on Group IV Photonics, GFP 2013 - Seoul, Korea, Republic of
Duration: 28 Aug 201330 Aug 2013

Publication series

NameIEEE International Conference on Group IV Photonics GFP
ISSN (Print)1949-2081

Conference

Conference2013 IEEE 10th International Conference on Group IV Photonics, GFP 2013
Country/TerritoryKorea, Republic of
CitySeoul
Period28/08/1330/08/13

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