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The kinetics of the light-induced defect creation in hydrogenated amorphous silicon - Stretched exponential relaxation

  • Hiroshima Institute of Technology
  • Electro-Chemical and Cancer Institute
  • Meikai University
  • Yamaguchi University

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Our model for light-induced defect creation in hydrogenated amorphous silicon is applied to its kinetics, i.e., the growing curve of light-induced dangling bond density as a function of illumination time, which is fitted to a stretched exponential function. Two parameters β and τ involved in the function are estimated as functions of saturated dangling bond density in terms of our model. These are compared with two experimental results, i.e., our results obtained from ESR measurements and Shimakawa et al.'s results obtained from photoconductivity measurements. The saturated dangling bond density is also measured as a function of the generation rate of free carriers. The experimental results are compared with calculated results and discussed.

Original languageEnglish
Pages (from-to)2131-2134
Number of pages4
JournalJournal of Non-Crystalline Solids
Volume354
Issue number19-25
DOIs
Publication statusPublished - 1 May 2008

Keywords

  • Amorphous semiconductors
  • Defects
  • Electron spin resonance
  • Luminescence
  • Silicon

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