The p-Si/fluoride interface in the anodic region: Damped and/or sustained oscillations

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	343-349
Number of pages	7
Journal	Journal of Electroanalytical Chemistry
Volume	327
Issue number	1-2
DOIs	https://doi.org/10.1016/0022-0728(92)80160-6
Publication status	Published - 10 Jun 1992

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@article{77b0c41107484c2abdd75a994cfc8ed6,

title = "The p-Si/fluoride interface in the anodic region: Damped and/or sustained oscillations",

author = "Chazalviel, \{J. N.\} and F. Ozanam and M. Etman and F. Paolucci and Peter, \{L. M.\} and J. Stumper",

year = "1992",

month = jun,

day = "10",

doi = "10.1016/0022-0728(92)80160-6",

language = "English",

volume = "327",

pages = "343--349",

journal = "Journal of Electroanalytical Chemistry",

issn = "1572-6657",

number = "1-2",

}

TY - JOUR

T1 - The p-Si/fluoride interface in the anodic region

T2 - Damped and/or sustained oscillations

AU - Chazalviel, J. N.

AU - Ozanam, F.

AU - Etman, M.

AU - Paolucci, F.

AU - Peter, L. M.

AU - Stumper, J.

PY - 1992/6/10

Y1 - 1992/6/10

U2 - 10.1016/0022-0728(92)80160-6

DO - 10.1016/0022-0728(92)80160-6

M3 - Article

AN - SCOPUS:0005676278

SN - 1572-6657

VL - 327

SP - 343

EP - 349

JO - Journal of Electroanalytical Chemistry

JF - Journal of Electroanalytical Chemistry

IS - 1-2

ER -