Abstract
We present the theory underlying the large numerical aperture objective micro-Raman backscattering experiment and apply it to the elaboration of a characterization methodology for the determination of the stress tensor in strained cubic semiconductor structures. The presented stress characterization technique consists in monitoring the variations of the stress-sensitive optical phonon peak position and linewidth while rotating stepwise the sample about its normal. The practical application of the technique is illustrated on a silicon-on-insulator (SOI) microelectronic structure demonstrating a plane stress-tensor determination.
| Original language | English |
|---|---|
| Pages (from-to) | 661-672 |
| Number of pages | 12 |
| Journal | Journal of Raman Spectroscopy |
| Volume | 39 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1 Jan 2008 |
Keywords
- Numerical aperture
- Raman microscopy
- Semiconductor
- Stress
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