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Theory and experiment of large numerical aperture objective Raman microscopy: Application to the stress-tensor determination in strained cubic materials

  • Institut polytechnique de Paris
  • Longjumeau
  • STMicroelectronics SA, France

Research output: Contribution to journalArticlepeer-review

Abstract

We present the theory underlying the large numerical aperture objective micro-Raman backscattering experiment and apply it to the elaboration of a characterization methodology for the determination of the stress tensor in strained cubic semiconductor structures. The presented stress characterization technique consists in monitoring the variations of the stress-sensitive optical phonon peak position and linewidth while rotating stepwise the sample about its normal. The practical application of the technique is illustrated on a silicon-on-insulator (SOI) microelectronic structure demonstrating a plane stress-tensor determination.

Original languageEnglish
Pages (from-to)661-672
Number of pages12
JournalJournal of Raman Spectroscopy
Volume39
Issue number5
DOIs
Publication statusPublished - 1 Jan 2008

Keywords

  • Numerical aperture
  • Raman microscopy
  • Semiconductor
  • Stress

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