Thermal decomposition of alkoxy monolayers grafted on silicon: A mechanistic model

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Abstract

A recent spectroscopic study showed that alkoxy monolayers grafted on a (111) silicon surface thermally decompose in the 200-400 C range by fragmentation of the alkyl chains [Surf. Sci. 601 (2007) 3961]. Here this behavior is reproduced by a numerical simulation, assuming that the elementary fragmentation steps have different probabilities, depending on the length of the fragments formed. The variation of the CH2/CH3 ratio, as determined experimentally by infrared spectroscopy, is reproduced with a set of fragmentation probabilities consistent with the enthalpy variation associated with each corresponding step.

Original languageEnglish
Pages (from-to)230-235
Number of pages6
JournalSurface Science
Volume609
DOIs
Publication statusPublished - 1 Mar 2013

Keywords

  • Grafting
  • Organic monolayers
  • Silicon
  • Thermal stability

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