Tritium induced defects in amorphous silicon

  • J. Whitaker
  • , J. Viner
  • , S. Zukotynski
  • , E. Johnson
  • , P. C. Taylor
  • , P. Stradins

Research output: Contribution to journalConference articlepeer-review

Abstract

We report the growth of tritium induced defects in tritium doped hydrogenated amorphous silicon (a-Si:H,T) as measured by electron spin resonance (ESR) and photothermal deflection spectroscopy (PDS). The measurements allow one to examine the accumulation of defects in a-Si:H,T where the defect production mechanism is known. Defects produced by tritium decay are found to be much less numerous than the number of decayed tritium atoms and they are metastable like Staebler-Wronski defects. These results provide new insight into the metastable defect creation and the role of hydrogen motion.

Original languageEnglish
Pages (from-to)159-164
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume808
DOIs
Publication statusPublished - 1 Jan 2004
Externally publishedYes
EventAmorphous and Nanocrystalline Silicon Science and Technology - 2004 - San Francisco, CA, United States
Duration: 13 Apr 200416 Apr 2004

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