Abstract
We report the growth of tritium induced defects in tritium doped hydrogenated amorphous silicon (a-Si:H,T) as measured by electron spin resonance (ESR) and photothermal deflection spectroscopy (PDS). The measurements allow one to examine the accumulation of defects in a-Si:H,T where the defect production mechanism is known. Defects produced by tritium decay are found to be much less numerous than the number of decayed tritium atoms and they are metastable like Staebler-Wronski defects. These results provide new insight into the metastable defect creation and the role of hydrogen motion.
| Original language | English |
|---|---|
| Pages (from-to) | 159-164 |
| Number of pages | 6 |
| Journal | Materials Research Society Symposium - Proceedings |
| Volume | 808 |
| DOIs | |
| Publication status | Published - 1 Jan 2004 |
| Externally published | Yes |
| Event | Amorphous and Nanocrystalline Silicon Science and Technology - 2004 - San Francisco, CA, United States Duration: 13 Apr 2004 → 16 Apr 2004 |