Ultrathin epitaxial rare-earth silicide interfaces on Si(111)7 × 7

  • O. Sakho
  • , F. Sirotti
  • , M. DeSantis
  • , M. Sacchi
  • , G. Rossi

Research output: Contribution to journalArticlepeer-review

Abstract

Monolayers of Dy and Ho deposited on Si(111)7 × 7 surfaces and annealed at T > 600°C convert into epitaxial pseudo-disilicide interfaces which are terminated by extra silicon at the surface. Extended and core electron states are probed by synchrotron radiation photoemission and provide a chemical characterisation of there two-dimensional interfaces which have been recently found to display a very strong dichroism in X-ray absorption studies.

Original languageEnglish
Pages (from-to)568-571
Number of pages4
JournalApplied Surface Science
Volume56-58
Issue numberPART 1
DOIs
Publication statusPublished - 1 Jan 1992

Fingerprint

Dive into the research topics of 'Ultrathin epitaxial rare-earth silicide interfaces on Si(111)7 × 7'. Together they form a unique fingerprint.

Cite this