Ultrathin nanostructured c-Si solar cells by low temperature and scalable processes

  • A. Gaucher
  • , A. Cattoni
  • , I. Massiot
  • , C. Dupuis
  • , W. Chen
  • , R. Cariou
  • , M. Foldyna
  • , P. Roca Cabarrocas
  • , L. Lalouat
  • , E. Drouard
  • , C. Seassal
  • , S. Collin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We report on the fabrication and characterization of both flat and patterned c-Si solar cells on glass. We use epitaxial layers grown by plasma enhanced chemical vapor deposition at low temperature (T<200°C), and anodic bonding on glass substrate. Inverted nanopyramids are fabricated by nanoimprint lithography and wet etching in alkaline solution. With 3μm-thick c-Si layers, the performances achieved with planar solar cells are Jsc = 18.3mA/cm2 and η = 6.1%. With an additional nanopyramid array on the front side of the cell, an improved short-circuit current of 25.3mA/cm2 is obtained. We present the latest experimental results and discuss the path to be followed to achieve low cost, ultrathin c-Si solar cells with a 15% targeted efficiency.

Original languageEnglish
Title of host publication2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479979448
DOIs
Publication statusPublished - 14 Dec 2015
Event42nd IEEE Photovoltaic Specialist Conference, PVSC 2015 - New Orleans, United States
Duration: 14 Jun 201519 Jun 2015

Publication series

Name2015 IEEE 42nd Photovoltaic Specialist Conference, PVSC 2015

Conference

Conference42nd IEEE Photovoltaic Specialist Conference, PVSC 2015
Country/TerritoryUnited States
CityNew Orleans
Period14/06/1519/06/15

Keywords

  • Crystalline silicon
  • epitaxial transfer
  • light trapping
  • nanoimprint lithography
  • photovoltaic cells
  • thin films

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