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1.55 μm high efficiency tapered DFB laser using UV 250 2-in technology process

  • V. Voiriot
  • , B. Thedrez
  • , J. L. Gentner
  • , J. M. Rainsant
  • , V. Colson
  • , C. Duchemin
  • , F. Gaborit
  • , S. Hubert
  • , J. L. Lafragette
  • , A. Pinquier
  • , L. Roux
  • , B. Fernier
  • Opto+-GIE

Résultats de recherche: Contribution à un journalArticle de conférenceRevue par des pairs

Résumé

We report on high external efficiency reduced far field divergence DFB laser emitting at 1.55 μm. A high spatial resolution lithography is used to define the tapered section of the spot size converter integrated in the device. Thanks to suitable UV-250 contact lithography process, sub-micron patterns, 2-inch homogeneity and run to run reproducibility is simultaneously achieved. 15°×15° front facet divergence is obtained allowing 3.6 dB coupling loss to an AR coated end-cleaved standard optical fibre. Threshold current as low as 11 mA and external efficiency up to 0.42 W/A at 25 °C have been measured on 500 μm long lasers.

langue originaleAnglais
Pages (de - à)33-36
Nombre de pages4
journalConference Proceedings-International Conference on Indium Phosphide and Related Materials
étatPublié - 1 janv. 1999
Modification externeOui
EvénementProceedings of the 1999 11th International Conference on Indium Phosphide and Related Materials (IPRM) - Davos, Switz
Durée: 16 mai 199920 mai 1999

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