A robust process for the fabrication of field emission backlights

B. Marquardt; C. S. Cojucaru; S. Xavier; P. Legagneux; P. Pribat

A robust process for the fabrication of field emission backlights

B. Marquardt
, C. S. Cojucaru
, S. Xavier
, P. Legagneux
, P. Pribat

Institut polytechnique de Paris
Thales Research & Technology

Résultats de recherche: Contribution à un journal › Article de conférence › Revue par des pairs

Résumé

In this paper, we present a novel process for the realization of large area, low cost field emission cathodes. The process makes use of alumina substrates, which are anodically oxidized in order to yield porous structures capable of hosting metal catalyst nanoparticles. By carefully controlling the final stage of the anodisation as well as the electrodeposition conditions, it is possible to fine tune the density of such catalysts in the range of 10 ⁸-10⁹/cm² . The catalytic growth of CNTs is subsequently performed at low temperature (∼ 600°C or below, thanks to the use of H₂0), using plasma enhanced chemical vapour deposition. There is no lithography need to make the cathode and current densities of ∼ ImA/cm² are easily obtained.

langue originale	Anglais
Pages (de - à)	1606-1609
Nombre de pages	4
journal	Proceedings of International Meeting on Information Display
Volume	8
état	Publié - 1 déc. 2008
Evénement	8th International Meeting on Information Display - International Display Manufacturing Conference 2008 and Asia Display 2008, IMID/IDMC/ASIA DISPLAY 2008 - Ilsan, Corée du Sud Durée: 13 oct. 2008 → 17 oct. 2008

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@article{1bc7ad1beee844269ae53f85a323e40b,

title = "A robust process for the fabrication of field emission backlights",

abstract = "In this paper, we present a novel process for the realization of large area, low cost field emission cathodes. The process makes use of alumina substrates, which are anodically oxidized in order to yield porous structures capable of hosting metal catalyst nanoparticles. By carefully controlling the final stage of the anodisation as well as the electrodeposition conditions, it is possible to fine tune the density of such catalysts in the range of 10 8-109/cm2 . The catalytic growth of CNTs is subsequently performed at low temperature (∼ 600°C or below, thanks to the use of H20), using plasma enhanced chemical vapour deposition. There is no lithography need to make the cathode and current densities of ∼ ImA/cm2 are easily obtained.",

author = "B. Marquardt and Cojucaru, \{C. S.\} and S. Xavier and P. Legagneux and P. Pribat",

year = "2008",

month = dec,

day = "1",

language = "English",

volume = "8",

pages = "1606--1609",

journal = "Proceedings of International Meeting on Information Display",

issn = "1738-7558",

note = "8th International Meeting on Information Display - International Display Manufacturing Conference 2008 and Asia Display 2008, IMID/IDMC/ASIA DISPLAY 2008 ; Conference date: 13-10-2008 Through 17-10-2008",

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TY - JOUR

T1 - A robust process for the fabrication of field emission backlights

AU - Marquardt, B.

AU - Cojucaru, C. S.

AU - Xavier, S.

AU - Legagneux, P.

AU - Pribat, P.

PY - 2008/12/1

Y1 - 2008/12/1

N2 - In this paper, we present a novel process for the realization of large area, low cost field emission cathodes. The process makes use of alumina substrates, which are anodically oxidized in order to yield porous structures capable of hosting metal catalyst nanoparticles. By carefully controlling the final stage of the anodisation as well as the electrodeposition conditions, it is possible to fine tune the density of such catalysts in the range of 10 8-109/cm2 . The catalytic growth of CNTs is subsequently performed at low temperature (∼ 600°C or below, thanks to the use of H20), using plasma enhanced chemical vapour deposition. There is no lithography need to make the cathode and current densities of ∼ ImA/cm2 are easily obtained.

AB - In this paper, we present a novel process for the realization of large area, low cost field emission cathodes. The process makes use of alumina substrates, which are anodically oxidized in order to yield porous structures capable of hosting metal catalyst nanoparticles. By carefully controlling the final stage of the anodisation as well as the electrodeposition conditions, it is possible to fine tune the density of such catalysts in the range of 10 8-109/cm2 . The catalytic growth of CNTs is subsequently performed at low temperature (∼ 600°C or below, thanks to the use of H20), using plasma enhanced chemical vapour deposition. There is no lithography need to make the cathode and current densities of ∼ ImA/cm2 are easily obtained.

M3 - Conference article

AN - SCOPUS:65649084203

SN - 1738-7558

VL - 8

SP - 1606

EP - 1609

JO - Proceedings of International Meeting on Information Display

JF - Proceedings of International Meeting on Information Display

T2 - 8th International Meeting on Information Display - International Display Manufacturing Conference 2008 and Asia Display 2008, IMID/IDMC/ASIA DISPLAY 2008

Y2 - 13 October 2008 through 17 October 2008

ER -

A robust process for the fabrication of field emission backlights

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