All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities

Abdelhamid Ghrib; Moustafa El Kurdi; Mathias Prost; Sébastien Sauvage; Xavier Checoury; Grégoire Beaudoin; Marc Chaigneau; Razvigor Ossikovski; Isabelle Sagnes; Philippe Boucaud

doi:10.1002/adom.201400369

All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities

Abdelhamid Ghrib
, Moustafa El Kurdi
, Mathias Prost
, Sébastien Sauvage
, Xavier Checoury
, Grégoire Beaudoin
, Marc Chaigneau
, Razvigor Ossikovski
, Isabelle Sagnes
, Philippe Boucaud

CNRS
STMicroelectronics SA, France

Résultats de recherche: Contribution à un journal › Article › Revue par des pairs

85 Citations (Scopus)

Résumé

An all-around stressor approach is presented to introduce homogeneous and high tensile strain, both in-plane and vertically, into n-doped germanium microdisks. A maximum biaxial strain up to 1.5% is achieved, close to the requirement to obtain a direct band gap germanium. The possibilities to obtain in this configuration modal optical gain in germanium microdisk cavities are discussed.

langue originale	Anglais
Pages (de - à)	353-358
Nombre de pages	6
journal	Advanced Optical Materials
Volume	3
Numéro de publication	3
Les DOIs	https://doi.org/10.1002/adom.201400369
état	Publié - 1 mars 2015

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10.1002/adom.201400369

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title = "All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities",

abstract = "An all-around stressor approach is presented to introduce homogeneous and high tensile strain, both in-plane and vertically, into n-doped germanium microdisks. A maximum biaxial strain up to 1.5\% is achieved, close to the requirement to obtain a direct band gap germanium. The possibilities to obtain in this configuration modal optical gain in germanium microdisk cavities are discussed.",

keywords = "Germanium, Microdisks, Silicon photonics, Strain engineering",

author = "Abdelhamid Ghrib and \{El Kurdi\}, Moustafa and Mathias Prost and S{\'e}bastien Sauvage and Xavier Checoury and Gr{\'e}goire Beaudoin and Marc Chaigneau and Razvigor Ossikovski and Isabelle Sagnes and Philippe Boucaud",

note = "Publisher Copyright: {\textcopyright} 2015 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim.",

year = "2015",

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doi = "10.1002/adom.201400369",

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T1 - All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities

AU - Ghrib, Abdelhamid

AU - El Kurdi, Moustafa

AU - Prost, Mathias

AU - Sauvage, Sébastien

AU - Checoury, Xavier

AU - Beaudoin, Grégoire

AU - Chaigneau, Marc

AU - Ossikovski, Razvigor

AU - Sagnes, Isabelle

AU - Boucaud, Philippe

PY - 2015/3/1

Y1 - 2015/3/1

N2 - An all-around stressor approach is presented to introduce homogeneous and high tensile strain, both in-plane and vertically, into n-doped germanium microdisks. A maximum biaxial strain up to 1.5% is achieved, close to the requirement to obtain a direct band gap germanium. The possibilities to obtain in this configuration modal optical gain in germanium microdisk cavities are discussed.

AB - An all-around stressor approach is presented to introduce homogeneous and high tensile strain, both in-plane and vertically, into n-doped germanium microdisks. A maximum biaxial strain up to 1.5% is achieved, close to the requirement to obtain a direct band gap germanium. The possibilities to obtain in this configuration modal optical gain in germanium microdisk cavities are discussed.

KW - Germanium

KW - Microdisks

KW - Silicon photonics

KW - Strain engineering

U2 - 10.1002/adom.201400369

DO - 10.1002/adom.201400369

M3 - Article

AN - SCOPUS:84925391022

SN - 2195-1071

VL - 3

SP - 353

EP - 358

JO - Advanced Optical Materials

JF - Advanced Optical Materials

IS - 3

ER -

All-Around SiN Stressor for High and Homogeneous Tensile Strain in Germanium Microdisk Cavities

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