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Anisotropy in metallic thin films patterned by the atomic saw method

  • H. Jaffrès
  • , L. Ressier
  • , F. Michelini
  • , D. Chandesris
  • , P. Le Fèvre
  • , H. Magnan
  • , J. L. Gauffier
  • , R. Mamy
  • , M. Goiran
  • , J. P. Peyrade
  • , J. F. Bobo
  • , J. C. Ousset
  • , J. P. Redoulès
  • , D. Bertrand
  • , A. R. Fert

Résultats de recherche: Contribution à un journalArticleRevue par des pairs

Résumé

The use of atomic saw method applied to thin metallic epitaxial systems with in-plane magnetization has allowed us to exhibit strong magnetic anisotropy. The structuration of thin 40 Å Co thin films into 0.5 μm large stripes have induced a uniaxial anisotropy field whose direction and magnitude 500 Oe is consistent with shape energy consideration. On the other hand, the same structuration applied to 20 Å Fe thin films have induced a uniaxial magnetic anisotropy explained by the observation of a uniaxial relaxation of the strain field after process. EXAFS experiments has permitted to quantify this lattice relaxation which is seen to distort the initial BCC Fe cell uniaxially inducing strong magnetoelastic effects.

langue originaleAnglais
Pages (de - à)132-134
Nombre de pages3
journalJournal of Magnetism and Magnetic Materials
Volume203
Numéro de publication1-3
Les DOIs
étatPublié - 1 janv. 1999

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